tightening restrictions further in 2024 to include EUV masks, etching machines, and other components. Chinese scientists are now pioneering alternative methods to bypass these sanctions.

Experts at the Table: Semiconductor Engineering sat down to discuss optical and EUV photomasks issues, as well as the challenges facing the mask business, with Naoya Hayashi, research fellow at DNP; ...

By intercepting particles before they land on the EUV mask containing the blueprint for the chips, EUV pellicles can significantly reduce defect rates, bringing the industry closer to the goal of ...

This enables the EUV lithography era of today, which is likely to continue for the foreseeable future. Initially, EUV became ...

Previous photolithography technologies used transmissive masks protected by a pellicle. For EUV lithography, however, the masks must be reflective and cannot have a protective pellicle as this ...

Another focus has been on the use of attenuated phase shift masks (attPSM) to enhance resolution in EUV lithography. Research has shown that the imaging physics of attPSM in EUV differs ...

Dai Nippon Printing Co., Ltd. (DNP, TOKYO: 7912) has successfully achieved the fine pattern resolution required for photomasks for logic semiconductors of the beyond 2nm (nm: 10-9 meter ...

EUV tools with a 11.2nm wavelength The Russian ... It means that all optical elements — such as mirrors, coatings, mask designs, and resists — must be specifically designed and optimized ...