High Power Magnetron Sputtering (HiPIMS) is an advanced physical vapor deposition (PVD) technique that has gained significant attention in recent years for its ability to produce high-quality thin ...

The team used magnetron sputtering, a method of physical vapor ... The result is an electrolysis method of producing green hydrogen using metal waste while minimizing the cost and environmental ...

What Are Sputtering Targets?Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor ...

In a real fab, metal layers are added to chips using some form of deposition or sputtering method, each of which needs some expensive vacuum equipment. [ProjectsInFlight] wanted a more ...

JX Advanced Metals has invested about 18 billion yen ($116 million) in a plant in Mesa, Arizona, which will become fully operational early this year. The facility will nearly double the company's U.S.