Ion beam sputtering is a sophisticated technique used for the deposition of thin films, which are essential in various applications, including electronics, optics, and materials science.

Another important aspect of recent studies is the angular dependence of sputtering yields. Research on silicon dioxide has demonstrated that varying the incidence angle of the ion beam can ...

Let us help you with your inquiries, brochures and pricing requirements Request A Quote Download PDF Copy Download Brochure The Helios 5 Laser PFIB System from Thermo ...

The multi-mode gas cluster ion source (GCIS ... Scan plates allow the beam to be rastered across the surface of the sample to produce an even sputter crater. The ability to generate Ar n ...

Larger systems are fitted with a heavy duty hydraulic hoist to lift the chamber top for system access ... fitted with electron beam evaporation, thermal evaporation, Knudsen cells, PLD, ion sources ...