This method utilizes a magnetron to create a plasma that enhances the sputtering process, allowing for better control over the deposition of materials. HiPIMS is particularly valued for its ...

What Are Sputtering Targets?Sputtering targets are the source materials for the preparation of sputtered thin films. In particular, high-purity sputtering targets are used in the physical vapor ...

digital process timer with "pause", variable height specimen table, hinged top plate and O-ring sealed vacuum chamber. Sputtering is achieved with an efficient DC magnetron. A quick-change target ...

KDF is committed to delivering the most advanced and reliable batch in-line sputtering systems at the industry’s lowest cost of ownership, KDF’s tools cover a wide variety of process requirements and ...